Sputter

Sputter deposition processes

Sputter deposition is a widely used technique to deposit thin films on substrates. The technique is based upon ion bombardment of a source material, the target. Ion bombardment results in a vapor due to a purely physical process, i.e. the sputtering of the target material. Hence, this technique is part of the class of physical vapor deposition techniques, which includes, for example, thermal ev...

Sputter-ion Pumps

The following paper outlines the working principles of sputter-ion pumps. The pumping mechanisms for reactive and inert gas species, as well as argon instability are explained. The operating pressure range, special designs for integrated linear pumps in accelerators and operational aspects are discussed.

Sputter-Etching of Heterogeneous Surfaces

In conventional sputter etching, heterogeneous surfaces are eroded at generally unpredictable rates. The reasons for this are discussed and a solution to the problem is given: Based on control of redeposition, the technique involves the use of a device called a “catcher,” which is placed near the target of the sputtering chamber to trap re-emitted particles. Experiments are described which conf...

Near sputter-threshold GaSb nanopatterning

Magnetron Sputter Epitaxy of GaN